Keramische Zerstäubungsziele.
- Galliumarsenid (GaAs)-Sputtertarget
- Galliumphosphid (GaP)-Sputtertarget
- Vanadiumsilicid (VSi2)-Sputtertarget
- Titansilicid (TiSi2)-Sputtertarget
- Wolframsilizid (WSi2)-Sputtertarget
- Tantalsilicid (TaSi)-Sputtertarget
- Molybdänsilicid (MoSi2)-Sputtertarget
- Niob-Silizid (NbSi2)-Sputter-Target
- Barium-Titanat (Barium-Titan-Oxid) (BaTiO3)-Sputter-Target
- Eisen-Bor-Oxid (FeBO3)-Sputter-Target